A buried-oxide trench-gate bipolar-mode JFET(BTB-JFET)with an oxide layer buried under the gate region to reduce the gate-drain capacitance Cgd is proposed.
提出了埋氧沟槽栅双极模式JFET(BTB-JFET),其在栅极区域下面添加埋氧以减小栅漏电容Cgd。
It is shown that neglecting the gate-drain capacitance of the MOSFET would lead to an overestimation of the optimum device width in the CMOS source degenerated LNA.
本文证明了在CMOS源端degeneration结构的低噪声放大器中，忽略场效应管的栅漏电容将造成对放大管的最优栅宽估计过大。
TrenchMOS was studied to improve the breakdown voltage(BVds),specific on-resistance(Ron) and gate-drain charge density(Qgd),which are the three most important targets of TrenchMOS.
围绕TrenchMOS的击穿电压BVds、特征导通电阻Ron和栅漏电荷Qgd这三个最重要的特性指标,对TrenchMOS进行分析和改进,提出了体内注入TrenchMOS的概念。