source/drain extension (SDE)

Polysilicon doped heavily is introduced as solid phase diffusion source to realize ultra shallow source and drain extensions.

1μm栅线条 ,重掺杂多晶硅做固相扩散源实现 CMOS晶体管超浅源漏扩展区 ,并且将二者有机结合起来 ,成功实现了栅长约为 84 。