ZnO films have been grown on C-plane sapphire substrate with the plasma-assisted metal-organic chemical vapor deposition (MOCVD) method.
生长在蓝宝石C面上的ZnO薄膜是通过等离子体金属有机物化学汽相淀积方法获得的 ,由其X光衍射得知 ,生长过程中分段退火和最后退火在薄膜中分别引入了张应力和压应力。
metallo organic chemical vapor deposition
有机金属化学汽相淀积
photochemical vapor deposition oxide
光化学汽相淀积氧化物
Simulation and optimization design in MOCVD reactor
金属有机化学气相沉淀反应器结构的模拟优化
cvd polysilicon
化学汽相淀积多晶硅
plasma chemical vapor deposition
等离子体化学汽相淀积
modified chemical vapor deposition
改进的化学汽相淀积
chemical vapor deposition reactor
化学汽相淀积反应器
The Praparation and Chemical Mechanism of Functional Graded Materials Using Metal Organic Chemistry Vapour Deposition;
金属有机化学气相沉积法制备功能梯度材料的方法和机理的研究
Research on Preparing Yttria Coatings by Metalorganic Chemical Vapor Deposition;
金属有机化学气相沉积法制备氧化钇涂层的探索研究
Growth of ZnO Films on Different Substrates by Metal Organic Chemical Vapor Deposition
不同衬底上氧化锌薄膜的金属有机化学气相沉积方法生长(英文)
Iridium Film Prepared by Metal-Organic Chemical Vapor Deposition
金属有机化合物化学气相沉积法制备铱薄膜的研究
Metal Organic Chemical Vapor Deposition( MOCVD) is a key technology in growing thin-films.
金属有机化学气相沉积(OCVD)一门制备薄膜材料的关键技术。
Synthesis and Characterization of Novel Copper（Ⅰ）Complexes as Precursors for Metal-Organic Chemical Vapor Deposition;
Cu（Ⅰ）金属有机化学气相沉积前驱物的合成与表征
A New Preparation Technology of Mica Pearlescent Pigment by Metal Organic Chemistry Vapour Deposition (MOCVD) and Their Application;
金属有机化学气相沉积（MOCVD）法制备云母珠光颜料新工艺及应用研究
The triangular pits eliminate of (110) a-plane GaN growth by metal-orgamic chemical vapor deposition
金属有机物化学气相沉积生长的a(110)面GaN三角坑缺陷的消除研究
A novel high reflectivity type of semiconductor saturable absorption mirror grown by metal organic chemical vapor deposition is presented.
利用金属有机气相淀积方法生长了一种新型吸收体:高反射率半导体可饱和吸收镜.
Studies of Metal Oxides Film Synthesized by Themal Vapor Phase Transport and Condensation;
金属氧化物薄膜的热汽相沉积法制备研究
thermochemistry of organometallic compounds
有机金属化合物热化学