Recently, more attention has been paid to a novel photoresist stripping technology based on atmospheric pressure plasma.
光刻胶去除技术在微电子工业中占有非常重要的地位,约占集成电路制造工艺的30-35%,去胶的好坏直接影响产品的成品率及器件和电路的制造成本。
A modified aerial image was obtained by convolving the aerial image with a Gaussian filter to smear the image in a manner analogous to resistive diffusion, and then applying a variable threshold resist model on the modified image to predict the CD (critical dimension) variations.
用高斯滤波器与空间影像进行卷积,得到改进的空间影像来模拟光刻胶的扩散,然后使用可变阈值光刻胶模型,以实际工艺数据拟合该模型参数,再把改进空间影像的相关信息作为输入,并根据可变阈值光刻胶模型所确定的光强阈值来预测CD(criticaldimension)变化,从而使光刻仿真的结果更精确地附合实际测量数据。
Progress in the Research of Chemical Amplified Photoresist;
化学放大光刻胶高分子材料研究进展
Research on thick photoresist mask electroplating process in micro-fabrication;
微加工厚光刻胶掩膜电镀工艺研究
Key technique of photoresist through-mask Electrochemical micromachining;
光刻胶掩膜微细电化学加工参数的试验研究
Atmospheric Pressure RF-Plasma System and Its Application in Photoresist Stripping;
常压射频冷等离子体系统及其在光刻胶去除技术中的应用
In microelectronics, the process of removing material, on a chip, left exposed by the exposure and development of the photoresist.
在微电子技术中,通过曝光并显影光刻胶除去芯片上的物质露出剩余部分的工艺。
Fundamentals and Lithographie Technology Based on Pulse Laser Exposing SU-8 Photoresist;
脉冲激光曝光SU-8胶的基础与光刻技术研究
Study on material removal theoretical model of zone polishing technology
环带抛光技术材料去除理论模型研究
Extraction Technology of Quenching Agent in Mineral Luminescent Materials and Spectral Property;
矿物发光原料中猝灭剂的去除技术与光谱特性
scaled down lithography
按比例缩小光刻技术
The Research on Nano-TiO_2 Photocatalytic Removal of Nitrogen Oxides;
纳米TiO_2光催化技术对氮氧化物去除的实验研究
The Study on Photocatalytic Technology for Surfactant Removal in Water;
光催化氧化技术去除水中表面活性剂的研究
Decomposition of Styrene Gas with Outer Combined Plasma Photolysis(OCPP) Technology
外置式联合等离子体光解技术去除苯乙烯气体
Study on the Improvement of Ashing Rate of Photoresist Ashing Process with CF4 Gas;
含氟气体的去光刻胶工艺灰化率提高的研究
Study on Key Technologies in UV-LED Fiber Lithography System
紫外LED光纤光刻系统关键技术研究
Removal of Humic Acid in Water with the Combination of TiO_2 Photocatalytic Oxidation and Microfiltration
TiO_2光催化和微滤结合技术对水中腐殖酸去除的研究
Improvement of Photo Resist Remove for the 11μm DRAM Deep Trench Capacitor Process
0.11μm DRAM技术中深沟壑底部光阻残余物去除工艺的改善研究
Study on Laser Interferometric Lithography Technology Based on Multi-beam Interference;
基于多光束相干的激光干涉光刻技术研究
In photography, the light sensitivity of film emulsion.
在摄影技术中,胶片感光乳剂的光敏度。
Investigation on Extreme Ultraviolet Lithography;
极紫外投影光刻中若干关键技术研究
Research on Electron Beam Nanolithogrpahy Based on AFM;
基于AFM的电子束纳米级光刻技术研究
Lithography Study of UV-LIGA Technology;
UV-LIGA技术光刻工艺的研究