The present study situation and the development trend of UV nanoimprint resists were analyzed.
总结了紫外纳米压印抗蚀剂的种类以及组分。
So,the article introduces several important UV photoresists and their development in recent years.
本文介绍了近年来几种主要的紫外光致抗蚀剂及其研究进展,对ArF激基体激光(193nm)光致抗蚀剂的各个组分进行了归纳综述。