Investigation of functions and effects of polishing pad conditioning in chemical mechanical polishing;
化学机械抛光中抛光垫修整的作用及规律研究
The performances of a polishing pad are determined by the type and properties of pad materials, the surface structure and state as well as the conditioning parameters.
抛光垫是化学机械抛光 (CMP)系统的重要组成部分。
According to the analysis of the structure of polishing pad,polishing machine and polishing slurry,the merits of fixed abrasives (FA)CMP were presented.
经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。
Study on Conditioner for Polishing Pad in CMP;
化学机械抛光用抛光垫修整器的研究
Study on Conditioning Technology of Polishing Pad in CMP;
化学机械抛光中抛光垫修整技术的研究
Study on the Effects of the Surface Texture and Constituent of the Pad in CMP;
抛光垫表面构造和组织对CMP影响效果的研究
A new three-body nonlinear-micro-contact model based on the the Sneddon s equation is de- veloped for chemical-mechanical polishing(CMP)with soft pad,which is different from the Hertz contact theory.
提出一种新的化学机械抛光(CMP)中软抛光垫的三体非线性微观接触模型。
Study on Conditioner for Polishing Pad in CMP;
化学机械抛光用抛光垫修整器的研究
Research on the Polishing of Silicon Wafer by Fixed Abrasive Pad
固结磨料抛光垫抛光硅片的探索研究
Study on Conditioning Technology of Polishing Pad in CMP;
化学机械抛光中抛光垫修整技术的研究
Study on Pad Properties & Effects on Processing in CMP;
抛光垫特性及其对化学机械抛光效果影响的研究
Influencing Factors of Conditioning Effect about Polishing Pad Conditioning for Chemical Mechanical Polishing
化学机械抛光用抛光垫的修整对修整效果的影响因素
Study the application of pad in chemical mechanical polishing for sapphire wafer
抛光垫在蓝宝石衬底化学机械抛光中的应用研究
Study on the Effects of the Surface Texture and Constituent of the Pad in CMP;
抛光垫表面构造和组织对CMP影响效果的研究
pad of steel wool used for polishing or smoothing.
用于打磨或抛光的钢丝绒的垫子。
One who does finish work, such as polishing, on iron.
抛光匠作抛光工作的人，如给铁抛光的人
Bio-polishing of cotton with Cellusoft Combi
生物抛光酶Cellusoft Combi
polished dressing
磨光，抛光，敷面打光，研磨
chemically polished chip
化学抛光管芯, 化学抛光微晶粒
Precision mirror polishing. Ultra-flat surface polishing.
精密镜面抛光,超平平面抛光.
When inspection indicates the surface to be filled, a rubbing compound may be used to obtain a high gloss.
表面经过检验合格后，可用抛光剂抛光。
Development of Electrorheological Polishing Device and Path Planning for Electrorheological Polishing;
电流变抛光装置开发与抛光轨迹规划
Effect of Polishing Processes on the Roughness of GaAs Wafers
抛光工艺对GaAs抛光片粗糙度的影响
electric polisher
电热抛光机,烫光机
Experimental Investigation of Stressed Mirror Polishing on Paraboloid
应力抛光技术加工抛物面的实验研究