wafer dose uniformity

基本解释晶圆离子注入均质性

网络释义

1)wafer dose uniformity,晶圆离子注入均质性2)wafer-to -wafer dose uniformity,晶圆间离子值入之均质性3)ion implanted impurity,离子注入杂质4)neutral ion injector,中性离子注入器5)amorphous implantation,对非晶半导体离子注入6)ion implanted base transistor,离子注入基极晶体管

用法和例句

Study in the Behavior of Implanted Ions in Oxide Crystals;

离子注入杂质在氧化物晶体中的行为研究

Doping- The process of the donation of an electron or hole to the conduction process by a dopant.

掺杂-把搀杂剂掺入半导体,通常通过扩散或离子注入工艺实现。

Optical properties of N-doped anatase TiO_2 films prepared by ion implantation

离子注入掺杂锐钛矿TiO_2薄膜的光学性能

mos ion implantation

mos结构离子注入

STUDY ON MECHANISM OF DIELECTRIC LOSS OF ION-IMPLANTATED POLYMERS

离子注入聚合物介质损耗机理的研究

STUDY ON OPTICAL AND ELECTRICAL PROPERTIES OF PES FILM IMPLANTED BY LOW ENERGY IONS

低能离子注入聚醚砜薄膜光学、电学性质的研究

Studies of Induced Defects and Its Optical Properties in Ion-implanted 6H-SiC;

离子注入6H-SiC引起的损伤及其光学性质的研究

Study on Tantalum/Yttrium Ion Implantation of YG8 Hard Alloy under Different Atmoasphere

不同气氛下YG8硬质合金的钽、钇离子注入研究

Study on Surface Modification of WC-Co Hard Alloy by Carbon, Vanadium and Chromium Ion Implantation

WC-Co硬质合金的C/V/Cr离子注入表面改性研究

Structure Analysis and Magnetic Properties of Mn-Implanted Si

Mn离子注入Si材料的结构分析及磁学性质

Effects of C-ion Implantation on Properties of TiN Coatings on Carbide Tools

C离子注入对硬质合金刀具TiN涂层性能的影响

Efficient Silicon Light-emitting pn Diode Prepared by Ion Implantation Locally-doped Defects

离子注入缺陷局域掺杂的高效率硅pn结发光二极管

Numerical Study of Sheath Characteristics with Dielectric Target in Plasma Source Ion Implantation;

等离子体源离子注入介质靶鞘层特性的数值研究

Influence of impurity and mass transfer of ionic cluster on ionic membrane

离子簇的传质及杂质对离子膜的影响

bipolar ion implantation

双极型掐用离子注入

implant masking step

离子注入用掩蔽工序

high output implanter

高功率离子注入装置

rod plasma injector

棒状等离子体注入器

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