Effects of plasma etching on Nafion~ membrane performances;
等离子体刻蚀对Nafion~膜性能的影响
Application of Emission Spectrometry in Trace Fluorine Analysis of Flue Gas from Plasma Etching;
发射光谱法在等离子体刻蚀废气微量F元素检测中的应用研究
Study of the ECR plasma etching process of PZT ferroelectric thin film materials;
PZT铁电薄膜材料的ECR等离子体刻蚀研究
NUMERICAL STUDIES ON ETCH PROFILES IN HIGH-DENSITY PLASMA;
高密度等离子体刻蚀轮廓的数值研究
Investigation of Etching SiCOH Films by Dual-Frequency Capacitively Coupled Plasma
SiCOH薄膜的双频等离子体刻蚀研究
Simulations of Plasma Etching Based on Diffusion Limited Erosion Model
基于扩散限制刻蚀模型的等离子体刻蚀模拟研究
Inductive Couple Plasmas Etching Processing of InSb Wafer
电感耦合等离子体刻蚀InSb芯片工艺的研究
Study of Inductively Coupled Plasma Etch of InP and Fabrication of 14xxnm Pump Laser Diodes;
感应耦合等离子体刻蚀InP研究与14xxnm泵浦激光器制作
Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
因此,等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
plasma sputter combined etching
等离子溅射复合刻蚀
Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;
碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究
planar plasma reactor
平面式等离子体腐蚀器
radical plasma etching
自由基等离子体腐蚀
Modeling and Simulation for Inductively Coupled Plasma Etching of Silicon in MEMS Fabrications;
MEMS加工中电感耦合等离子体（ICP）刻蚀硅片的模型与模拟
Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching
离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
radial flow plasma etching reactor
径向两等离子体腐蚀装置
parallel plate plasma etcher
平行板等离子体腐蚀装置
Researches on Laser Ablation Induced Plasma Emission Spectra
激光烧蚀诱导等离子体光谱实验研究
Plasma Performance for Laser Ablation of Boron-Potassium Nitrate
激光烧蚀硼-硝酸钾的等离子体特性
Investigation on Characteristics of Ablation Plasma Induced by Intense Pulsed Ion Beam;
强脉冲离子束产生的烧蚀等离子体特性的研究