This paper focuses on the positive photoresist’s application performance influence that the graft matrix and 2,1,5-sulfonylchloride(2-azo-1-naphthoquinone-5-sulfonyl chloride)(NDQ),which are used for composing LCD positive photoresist sensitive resin(PAC).
本文研究了液晶显示器件(LCD)正型光致抗蚀剂用感光树脂(PAC)所需接枝母体和2,1,5-重氮萘醌磺酰氯(NDQ)对正型光致抗蚀剂应用性能的影响。
The importance of photoresists in microelectronic industry is described in this review,emphasizing the characteristics of polysilane photoresists and the developing situation of ultra violet, deep ultraviolet, X-ray,electron-beam polysilane photoresists etc.
概述了光致抗蚀剂在微电子工业中的作用,着重介绍了聚硅烷光致抗蚀剂的特点,以及聚硅烷紫外、深紫外、X射线、电子未等抗蚀剂的发展状
Polysilynes, a new kind of high-performance materials, are reviewed on the present investigation of their synthesis, structure, reactions and applications as semiconductors, conductive SiC thin films, optical waveguides and photoresists.
本文综述了一类新型的高功能材料——聚硅炔的合成、结构、反应以及作为半导体、导电性SiC薄膜、光学波导器和光致抗蚀剂的应用的研究现状。
Preparation of Cresol-formaldehyde Resins Used for Making Positive Photoresist;
正性光致抗蚀剂用酚醛树脂的制备
Research progress and application status of UV positive photoresist;
紫外正性光致抗蚀剂的研究进展及应用现状
Experiments on two-photon Optical storage in photoresist;
以光致抗蚀剂为记录介质的双光子存储实验
So,the article introduces several important UV photoresists and their development in recent years.
本文介绍了近年来几种主要的紫外光致抗蚀剂及其研究进展,对ArF激基体激光(193nm)光致抗蚀剂的各个组分进行了归纳综述。
photoresist mask pattern
光致抗蚀剂掩模图形
Specification for photoresist/E-beam resist for hard surface photoplates
GB/T16527-1996硬面感光板中光致抗蚀剂和电子束抗蚀剂规范
The synthesis and properties of a new dissolution inhibitor for 193nm photoresist
193nm光致抗蚀剂用新型阻溶剂的合成及性能研究
Epoxy Resin Modified Hyperbranched Polyesters-Synthesis, Properties and Application for Photoresist;
环氧树脂改性超支化聚酯的合成、性能及光致抗蚀剂应用
resist patterning step
光致抗蚀图形成工序
fine featured resist
精细结构光刻用抗蚀剂
Polymer Light-Emitting Diodes Based on Erosion-Resistant HTLs
基于抗侵蚀空穴传输层的聚合物电致发光器件
Standing wave effect in the resist is companied with the exposure process.
驻波效应是抗蚀剂在曝光过程中的寄生现象。
organic resist stripper
有机抗蚀剂去除装置
The composition and characteristic of liquid photo imageable etching resist ink is introduced briefly, and the perfect blueprint is also described in this paper.
综述了液态光致抗蚀油墨的组成、特性及其诱人的发展前景。
Electron-beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
The research of anti-tarnishment of silver antiques treated with corrosion inhibitors under light exposure test;
银器文物缓蚀处理抗光照腐蚀的研究
radiophotoluminescence dosimeter
辐射光致发光剂量计
radiophotoluminescent dosimeter
放射光致发光剂量计
A substance having the capability or tendency to cause corrosion.
腐蚀剂具有导致腐蚀能力或倾向的物质
Study on a Vapor Inhibitor for CO_2 Corrosion in Deep Gas Field;
一种深层天然气田抗CO_2腐蚀缓蚀剂的研究
thermoluminescence dosimetry
热致发光剂量测定法
thermoluminescent dosimetry apparatus
热致发光剂量测定仪