Study of single layer inhomogeneous Ge_(1-x)C_x antireflection coating prepared by reactive low voltage ion plating technique;
用低压反应离子镀的方法制备Ge_(1-x)C_x单层非均匀增透膜的研究
Ion beam assisted deposition of infrared wideband antireflection coating on micro optical components used in low temperature;
离子束辅助淀积低温微光学元件红外宽带增透膜
1064,532 nm frequency-doubled antireflection coating was designed on LiB_3O_5(LBO) substrate using vetor addition method.
采用矢量合成法设计了LiB3O5(LBO)晶体上1064 nm,532 nm二倍频增透膜,在1064 nm处的反射率为0。
Influence of inhomogeneities on the spectral characteristics of AR coatings;
非均匀性对增透膜增透特性的影响
The optical constants suitable for designing and depositing 193nm AR coatings were calculated,and 193nm AR coatings were designed,produced and characterized on the basis of the calculated results.
计算了适用于193nm增透膜设计与制备的基底与薄膜材料的光学常数,并在此基础上对193nm增透膜进行了设计、制备与性能分析。
In addition, the refractive index, the structure of the layers, center wavelength of 633nm and 1 315nm baffle-board, AR coatings and times control method were presented .
先后得到了Ta2O5和SiO2单层薄膜厚度均匀性调控结果以及不同波长处薄膜折射率,并定性地分析比较了离子束溅射和电子束蒸发制备的薄膜结构;制备并测试了633nm,1315nm反射薄膜以及增透膜。
The technological process of polymer nanoporous antireflection film fabrication is discussed in detail.
论述了聚合物纳米孔隙增透膜的制备工艺流程,分析了聚合物材料分子量、实验环境温度和湿度、溶剂挥发性等条件对纳米孔隙增透膜的影响。
6 m m antireflection film on ZnSe substrate and the performance of the coated sample.
6μm增透膜的设计制备和镀膜后的性能进行分析。
Preparation and optical properties of SiO_2 AR coating;
SiO_2光学增透膜的制备及光学性能
A new method for AR coating in mass production of traveling wave SOA;
一种适合于大量制备行波SOA增透膜新技术
Based on Jones matrix theory,characteristic of 1/4 wavepalte with one side HR coating and the other side AR coating is analyzed in this paper.
基于光矢量的琼斯矩阵理论 ,分析了单面镀有高反膜 ,另一面镀有增透膜的 1/4波片工作特性。
Nano-porous SiO2 antireflective film with high-strength was made using dipping-coating technique with ammonia process post treatment by Sol-Gel method.
激光技术的发展对增透膜的要求越来越高。
Optical Waveguide Devices and Their anti-reflection Coatings in Silicon-on-Insulator;
SOI光波导器件及其增透膜的研究
Studied on Sol-gel Derived Silica Antireflective Coatings Modified by Polyether;
聚醚改性溶胶—凝胶SiO_2增透膜的研究
Study on the SiO_2 Antireflective Coatings Prepared from Sol-Gel Process;
溶胶—凝胶法制备SiO_2增透膜的研究
The Study on Antireflection Films of 808nm Semiconductor Laser and SLA;
808nm半导体功率放大激光器增透膜研究
Design and Fabrication of 400-1100nm AR Film
400-1100nm宽带增透膜的设计与制备
Preparation and Characterization of Hydrophobic SiO_2 Antireflective Coating
疏水性SiO_2增透膜的制备与表征
Study and Fabrication of Visible and IR Dual-Band Broadband Antireflection Coating
可见与红外双波段宽带增透膜的研制
Study on High Performance Infrared Wide-band (7～14μm) Anti-reflective Film on ZnSe Substrate
ZnSe基底7～14μm波段宽带增透膜
Preparation and properties of hafnium oxynitride protective films and anti-reflection films on ZnS substrates
ZnS上HfON保护膜及增透膜系的制备和性能研究
Preparation and Study of Antireflection Coatings with Higher Laser Induced Damage Threshold on the LBO Crystal;
LBO晶体表面高激光损伤阈值增透膜的研制
Using the simulated annealing algorithm to design multilayer reflection reducing coating in the visible region;
用模拟退火算法设计可见光区多层增透膜系
Study and Fabrication of Visible and Ir Dual-Band AR Coating
可见与红外双波段增透膜的研究与制备
Effects of Environments and Gas Pressures on Laser-Induced Damage of Anti-Reflection Films
环境气氛及气压对增透膜真空激光损伤的影响
Influence of buffer layer on adhesion of 1064 nm,532 nm frequency-doubled antireflection coating to LBO crystal
缓冲层对LBO晶体上1064nm,532nm增透膜附着力的影响
Study on Preparation and Performances of 1064 nm, 532 nm Frequency-doubled Antireflection Coating for LBO
LBO晶体上1064nm,532nm二倍频增透膜的制备和性能
Growth of High Precision Anti-Reflectance Multilayers under Broadband Monitoring and Controlling
宽光谱监控法镀制高精度增透膜的研究
Design and Fabrication of High Performance Antireflection Coatings with Double Waveband
玻璃基底上双波段增透膜的设计与制备
Investigation of Nanoporous Polymer Films Applied in Antireflection Coatings and Photonic Crystals;
纳米孔隙聚合物薄膜在增透膜和光子晶体方面的应用研究