We also discussed the growth mechanism of the microcrystalline silicon thin films from the aspect .
实验采用等离子体增强化学气相沉积(PECVD)法在玻璃衬底上制备了微晶硅薄膜。
Non-uniformity of microcrystalline silicon thin film deposited by VHF-PECVD along the growth direction was studied.
本文研究了采用VHF PECVD技术制备的微晶硅薄膜的纵向均匀性。
The crystallization affected by annealing studied on microcrystalline silicon thin films fabricated on tantalum;
获得了可用于太阳能电池的微晶硅薄膜的最佳晶化参数。
Studies on surface roughness and growth mechanisms of microcrystalline silicon films by grazing incidence X-ray reflectivity;
微晶硅薄膜的表面粗糙度及其生长机制的X射线掠角反射研究
Influence of silane concentration on microstructural and electrical properties of microcrystalline silicon films;
硅烷浓度对微晶硅薄膜微结构及电学性质的影响
A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF-PECVD technique
椭圆偏振技术研究VHF-PECVD高速沉积微晶硅薄膜的异常标度行为
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
Deposition conditions were optimized to improve the deposition rate of microcrystalline silicon thin films.
本文以微晶硅薄膜的沉积速率为重点，以优化沉积条件、提高微晶硅薄膜的沉积速率为目标，通过射频等离子体化学气相沉积(RF-PECVD)和甚高频等离子体化学气相沉积(VHF-PECVD)，系统地研究了沉积气压、射频功率、气体流量及硅烷浓度等沉积条件对薄膜的沉积速率、晶化率、择优晶向、晶粒大小、表面形貌、结构演化的影响，并对等离子体成膜机理、薄膜机构演变机理做了初步的探究。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
采用甚高频等离子体增强化学气相沉积(VHF-PECVD)技术制备了系列不同沉积条件的微晶硅薄膜。
Hydrogenated microcrystalline silicon(μc-Si:H)films with a high deposition rate of 1.
使用热丝化学气相沉积技术制备微晶硅薄膜(沉积速度为1。
Studies on fabrication and magnetic permeability spectra of AgNbFeB nano-crystalline film;
AgNbFeB纳米微晶薄膜材料的制备及磁谱特性研究
Study on the Microstructure of Microcrystalline Silicon Thin Films by VHF-PECVD
VHF-PECVD制备微晶硅薄膜的微结构研究
Preparation of Nano-(Micro-) Crystal Thin Films on Self-Source Substrate;
反应性基片上制备纳米（微米）晶薄膜
Influence of boron on the properties of intrinsic microcrystalline silicon thin films
硼对沉积本征微晶硅薄膜特性的影响
An optical emission spectroscopy study on the high rate growth of microcrystalline silicon films
高速沉积微晶硅薄膜光发射谱的研究
Microstructure and Mechanical Properties of Amorphous Carbon Nitride Thin Films;
非晶态碳氮薄膜的微观结构与力学性质
Study of a-Si:H Microstructure by MWECR CVD Technique;
MWECR CVD制备氢化非晶硅薄膜的微结构研究
Fabrication of the Microcrystalline Silicon Materials and Solar Cells by PECVD;
PECVD法制备微晶硅薄膜材料及太阳能电池
Investigation on Activation Energy of Intrinsic Microcrystalline Silicon Thin Films Deposited by VHF-PECVD
VHF-PECVD沉积本征微晶硅薄膜激活能特性研究
High rate growth and electronic property of μc-Si∶H
微晶硅薄膜高速沉积及电学性质的研究
Optimized Growth Conditions and High Deposition Rate of μc-Si∶H Films
氢化微晶硅薄膜的两因素优化及高速沉积
A novel means for preparing nano-microcrystalline NiO_x films by magnetron sputtering
基于磁控溅射制备纳米微晶NiO_x薄膜的方法
Influence of Substrate Temperature on the Growth of μc-SiGe Thin Film
衬底温度对氢化微晶硅锗薄膜生长的影响
Effect of Al-doping on crystallinity and microstructure of ZnO:Al thin films
铝掺杂对ZnO:Al薄膜结晶性能与微观组织的影响
Effects of Nitrogen Doping on Microstructure of Fluorinated Amorphous Carbon Thin Films
氮掺杂对氟化非晶碳薄膜微观结构的影响
Single-chamber deposition of intrinsic microcrystalline silicon thin film and its application in solar cells
单室沉积本征微晶硅薄膜及其在电池中的应用
On preparation of WO_3 crystal film and its microstructure
三氧化钨晶化薄膜的制备及微观结构研究
Influence of Hydrogen on Microcrystalline Silicon Thin Film in Low Temperature Deposition and Annealling Process
氢在微晶硅薄膜低温沉积及退火过程中的影响