Plane wave diffraction by arbitrarily shaped dielectric gratings is first analyzed by the MEI method in this paper.
本文首次用ＭＥＩ方法分析了任意形状的介质光栅对平面波的绕射作用，针对周期性结构的特点，利用周期空间的Ｇｒｅｅｎ函数完成ＭＥＩ方程的建立。
Laser-induced damage thresholds of multi-layer dielectric mirrors and multi-layer dielectric gratings were investigated in this paper.
对多层介质膜光栅以及介质膜反射镜的激光损伤阈值进行了系统的研究。
Analysis on multilayer calculation of dielectric reflection gratings;
介质反射光栅中多层膜计算的研究
Research on the Characteristics of the Guided-mode Resonances in Dielectric Subwavelength Gratings;
亚波长介质光栅的导模共振效应特性研究
Study on the Characteristic of Appearance of Multilayer Dielectric Grating Mask;
多层介质膜光栅掩膜形貌特性的研究
Profile Control and Detection of Multi-layer Dielectric Grating Masks;
多层介质膜光栅掩模槽形的控制与检测
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
Analysis of Performance of 0.25 μm Dielectric Defined Gate and Normal Process Gate PHEMTs
0.25μm介质栅与非介质栅PHEMT的性能比较分析
Rigorous Coupled-wave Analysis for the High Reflective Mirror Used in Multi-layer Dielectric Grating
多层介质膜光栅用高反射镜的严格耦合波分析(英文)
Effect of Electric Filed Enhancement on Laser-induced Damage Morphology of Multi-layer Dielectric Grating
电场的增强作用对介质膜光栅损伤形貌的影响(英文)
Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film
高介电栅介质ZrO_2薄膜的物理电学性能
Preparation and Property of High-k HfO_2 Gate Dielectric Materials
高介电常数HfO_2栅介质的制备及性能
Gate Leakage Properties of Small-Scaled High-k Gate Dielectric MOS Devices;
小尺寸高k栅介质MOS器件栅极漏电特性研究
Electrical Properties of High-k Gate Dielectric SiGe MOS Devices;
高k栅介质SiGe MOS器件电特性研究
Study on Surface and Interfacial Characteristics of HfO_2 High-k Gate Dielectric
HfO_2栅介质的表面界面特性研究
Influences of Different Interlayers on Properties of MOS with HfTaON Gate Dielectric
不同界面层对HfTaON栅介质MOS特性的影响
Study on Electrical Characteristics of Ge-pMOSFET with Ultrathin High-k Gate Dielectrics
超薄高k栅介质Ge-pMOSFET的电特性研究
AlGaN/GaN MIS-HEMT with Magnetron Sputtered AlN
磁控溅射AlN介质MIS栅结构的AlGaN/GaN HEMT
Thermal stability and electrical properties of high-k LaErO_3 films
作为高介电常数栅介质材料的LaErO_3薄膜热稳定性和电学性质的研究
Model and Technology of High-k Gate Dielectric MOS Devices;
高k栅介质MOS器件模型和制备工艺研究
Studies on the High-K Gate Dielectrics MOSFET and Related Device Effects;
高K介质栅纳米MOSFET特性及相关器件效应的研究