Deposition of High Quality GaN Film Under High ECR Plasma Density?
在高ECR等离子体密度下沉积高质量氮化镓薄膜(英文)
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An intense ECR ion source for ADS ( accelerator driven sub - critical system ) is described.
介绍了正在研制的一台强流ECR离子源.
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The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.
利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.
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The numerical methodresolving the wave propagation and absorption of the electron cyclotron resonance ( ECR ) is proposed.
介绍了电子回旋共振 ( ECR ) 波的传播与吸收的数值求解方法.
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ZrN thin films were prepared on 45 # steel by using ECR - microwave plasma source enhanced deposition.
利用ECR - 微波等离子溅射沉积技术不同偏压下在45 # 钢基体上制备了ZrN薄膜.
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Then the flight dynamics model of the ECR helicopter was constructed.
以此为基础,建立了电控旋翼直升机的飞行动力学模型.
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Ti - O film was prepared by microwave - electron convolute resonance ( MW - ECR ) magnetron filter arc deposition process.
采用微波电子回旋 共振 磁过滤弧设备制备钛氧薄膜.
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