X-ray photoelectron spectroscopy analysis (XPS) was used to analyze the tin ion permeation near the surface of different float glass samples.
利用X射线光电子谱仪(X-ray photoelectron spectroscopy,XPS)对国内外浮法玻璃样品(样品A和样品B)下表面渗锡情况进行了对比分析。
The films were characterized with Raman spectroscopy,X-ray photoelectron spectroscopy(XPS),and atomic force microscopy(AFM).
利用双放电腔微波ECR等离子体增强非平衡磁控溅射技术,在Si(100)上制备氮化碳薄膜,并对薄膜进行了拉曼(Raman)、原子力显微镜(AFM)、X射线光电子谱(XPS)等结构的表征。
The interaction between Pt and CeO 2 was studied by X-ray photoelectron spectroscopy.
用X射线光电子谱研究了CeO2 和Pt间的相互作用 ,探讨了通过相互作用能提高CeO2 的氧化还原反应活性的机理 ,并与通常的金属和载体强相互作用的机理进行了比较。
XPS Study on Electronic Structure for PtSi/p-Si(111);
利用X射线光电子谱对PtSi/p-Si(111)的电子结构研究
It is well known that low energy ion sputtering plaps an important role in quantification of surface composition by AES and XPS,such as to clean surface contamination and obtain depth profiles by low energy ion beam sputtering,ect.
由于离子溅射改变了固体表面化学成分，引起表面成分的再分布，使俄歇电子谱、X射线光电子谱以及二次离子质谱等表面分析手段，对溅射后固体表面成分的定量分析结果与实际结果有较大的差别。
The formation process of Ti/Al2O3(1102) interface has been studied by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy(AES).
用X射线光电子谱（XPS）和俄歇电子能谱（AES）研究了Ti／Al_2O_3界面形成的过程。
80),grown by plasma enhanced chemical vapor deposition,were studied with X ray photoelectron spectroscopy.
用X射线光电子谱研究了由等离子体增强化学气相沉积方法制备的富硅a SiNx∶H(x≤ 0 。