Isolation of duck microsatellite markers using dual-suppression-PCR technique;
利用双重抑制PCR技术分离鸭微卫星标记
Isolation of goose microsatellite markers using dual-suppression-PCR technique;
双重抑制PCR技术分离鹅微卫星标记
As one of candidates for next node in lithography of integrated circuit(IC),double patterning technology(DPT) has complicated process steps that may prevent it from being utilized in production.
作为集成电路光刻设计下一节点发展的候选之一,双重图形技术(DPT)面临的诸多复杂过程将影响其在制造领域的迅速应用,其中最突出的因素是设计的复杂度和数据量急剧增长。