Multilayers on Extreme Ultraviolet Lithography Masks and Illumination Error;
极紫外投影光刻掩模的多层膜与照明误差
Fabrication of continuous relief mask for diffractive plane focus lens;
连续型平面衍射聚光透镜掩模的制作
A Novel GMTI Method Based on Masking Technique;
一种利用掩模法抑制杂波的GMTI方法
Thickness uniformity of Ni microstructure deposited by through-mask electroplating;
掩模电镀镍微结构的镀层均匀性研究
Phase-shifting mask for 100nm node ArF excimer laser lithography;
用于100nm节点ArF准分子激光光刻的相移掩模技术
Process window improvement is presented due to off-axis illumination(OAI) and phase-shifting mask(PSM) for 193 nm immersion lithography at 65 nm node.
研究了交替型相移掩模及离轴照明对65nm分辨率ArF浸没式光刻的影响。
An algorithm for space target motion trajectory acquisition based on multi-frame addition and creation of background masking frame was put forward.
在深入分析恒星跟踪和目标跟踪两种模式下星敏感器成像特点的基础上,针对星图中空间目标运动轨迹提取算法进行了研究,提出了基于序列图像多帧累加背景掩模帧生成的目标提取算法。