By means of XRD and DTA, were studied the atomic distribution functions and crystallization process of amorphous Ni-P alloys prepared by impulse electroless and electroless plating.
利用Ｘ射线衍射（ＸＲＤ）及热分析（ＤＴＡ）技术，研究了脉冲化学镀与化学镀非晶态Ｎｉ－Ｐ合金的原子分布函数及晶化过程，得出了两种非晶态合金的微观结构信息（平均原子间距，相应配位原子数和短程有序畴）及各特征温度的晶化激活能。