Effect of secondary annealing on Al/Ti/n-GaN/Si ohmic contacts;
二次退火对Al/Ti/n-GaN/Si欧姆接触的影响
The key of new process focuses on 2 points:one is lower cold deformation ratio and another is 2nd annealing at lower temperature(250 , 30 min).
工艺的关键在于在相对低的最后一次变形率(ε=30%)条件下,进行低温二次退火(250℃/30min),用该工艺轧制所得银带在自然时效时力学性能十分稳定。
The measure of twice stable annealing process is discussed.
采用二次稳定化退火处理 ,解决了 Cr17Ni2钢异质焊接接头刀状腐蚀的问题。